CLC
CLC/BTWG 83-1 - On-line monitoring of metallic contamination in silicon wafers
To prepare a draft standard, as described in BT(IE/NOT)2 for measurement of metallic contamination in silicon wafers based upon novel photo-generated minority carrier electrical techniques.
On-line monitoring of metallic contamination in silicon wafers
To prepare a draft standard, as described in BT(IE/NOT)2 for measurement of metallic contamination in silicon wafers based upon novel photo-generated minority carrier electrical techniques.
General Information
Status
Inactive
Sector
V17 - ELECTRONIC MEASURING EQUIPMENT
Work Field
Information technology
Parent